Office of Technology Transfer – University of Michigan

Wire-grid Polarizers Fabricated by Web-based Imprinting

Technology #3395

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Lingjie Jay Guo
Managed By
Joohee Kim
Licensing Specialist, Physical Sciences & Engineering 734-764-8202
Patent Protection
US Patent Pending


Nanolithography is a crucial step in the field in nanotechnology as it enables the patterning and fabrication of nanostructures. Traditional lithography relies on modification of the physical or chemical properties of a material by electrons or photons to form a pattern. Nanoimprint lithography relies on the direct mechanical deformation of a material to form the patterns and overcomes the resolution limits of traditional lithography. There is still a need for developing nanopatterning techniques that can achieve high resolution, yield high throughput and yet remain cost-effective.


Researchers at the University of Michigan have developed a modified lithography method termed roll-to-roll nanoimprinting lithography (R2RNIL). The R2RNIL technique is based on a mechanical embossing approach, but with a nanopatterning speed that is increased at least by one order of magnitude. R2RNIL uses a roller type mold for imprinting on a flexible polymer web with high throughput and can potentially be used for patterning large areas without defects.

Applications and Advantages


  • Fabrication of nanostructures and nano-devices
  • Fabrication of large area metal wire grid polarizers


  • High throughput, low-cost and high resolution
  • Roller mold enables easier separation between mold and patterned structures thus resulting in lower number of defective patterns