Office of Technology Transfer – University of Michigan

Shrinkage Techniques for Nanoscale Patterning

Technology #4549

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Pei-Cheng Ku
Managed By
Keith Hughes
Assistant Director, Physical Sciences & Engineering 734-764-9429


Nanolithography tools suffer two major shortcomings: low throughput and high maintenance cost. These issues make them undesirable for mass-production of nanoscale devices, where this mass-production is often already the bottleneck in nanotechnology fields. Examples can be found in nano-cantilever chemical sensor array and zero-mode waveguides for resolving single-molecular dynamics. Conventional optical lithographic tools can provide high throughput and have positively impacted the mass-production of microscale devices. However, as yet, their resolution limit cannot achieve the patterning scale necessary to fulfill the properties of nanoscale devices.


Researchers at the University of Michigan have developed a method of nanopatterning using electrodeposition as a novel technique to shrink microscale patterns down to the nanoscale dimensions. This technique can achieve mass-production of sub-100nm nanoscale patterning by using conventional lithography tools. The shrinkage is well-controlled and uniform over a large sample area with an exceptional lower dimensional limit.

Applications and Advantages


  • Nanopatterning


  • Uses conventional lithography techniques
  • Achieves sub-100nm nanoscale patterning
  • High throughput